24 th European Mask Conference EMC 2008 Proc. SPIE Vol. 6792 (2008) F. Hillmann , Gerd Scheuring, Hans-Jürgen Brück New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA Condenser
	Proc. SPIE Vol. 6533 (2007) SPIE Digital Library Gerd Scheuring, Stefan Döbereiner, F. Hillmann , Günther Falk, Hans-Jürgen Brück A new approach for defect inspection on large area masks
	21 th European Mask Conference EMC 2005 SPIE Digital Library F. Hillmann , Stefan Döbereiner, Christian Gittinger, Richard Reiter, Günther Falk,Hans-Jürgen Brück, Gerd Scheuring, Artur Bösser, Michael Heiden, Gerhard Hoppen, Wolfgang Sulik, Wolfgang Vollrath DUV Water Immersion Technology Extends Linearity, First Results from the new 65nm Node CD Metrology System LWM500 WI
	21 th European Mask Conference EMC 2005 SPIE Digital Library Jochen Bender, Michael Ferber, Klaus-Dieter Röth, Gerhard Schlüter, Walter Steinberg, Gerd Scheuring, F. Hillmann Actual measurement data obtained on new 65nm generation mask metrology tool set
	21 th European Mask Conference EMC 2005 F. Gans, R. Liebe, J. Richter, T. Schätz, B. Hauffe, F. Hillmann , S. Döbereiner, H.-J. Brück, G. Scheuring, B. Brendel, L. Bettin, K.-D. Röth, W. Steinberg, G. Schlüter, P. Speckbacher, W. Sedlmeier, T. Scherübl, W. Häßler-Grohne, C. G. Frase, S. Czerkas, K. Dirscherl, B. Bodermann, W. Mirandé, H. Bosse Results of a round robin measurement on a new CD mask standard
	Proc. SPIE Vol. 5148 (2003), p. 158-168 R. Jonckheere, V. Philipsen, G. Scheuring, F. Hillmann , H.-J. Brück, V. Ordynskyy, K. Peter Through-pellicle capable, DUV-based CD metrology on reticles for wafer fab and R&D environment
	Proc. SPIE Vol. 5148 (2003), p. 148-157 Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Döbereiner, F. Hillmann , Hans-Jürgen Brück, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Shiuh-Bin Chen, Parkson W. Chen, Rik M. Jonckheere, Vicky Philipsen, Thomas Schätz, Karl Sommer Implementation of 248-nm based CD metrology for advanced reticle production
	Proc. SPIE Vol. 5148 (2003), p. 138-147 G. Scheuring, A. Petrashenko, S. Döbereiner, F. Hillmann , H.-J. Brück; A. C. Hourd, A. Grimshaw, G.Hughes, S.-B. Chen, P. Chen, T. Schätz, T. Struck; P. van Adrichem, H. Boerland; S. Lehnigk Fully automated CD - Metrology and Mask Inspection in a Mask Production Environment using the MueTec M5k DUV Tool
	Proc. SPIE Vol. 4889 (2002), p. 319-327 Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Döbereiner, F. Hillmann , Hans-Jürgen Brück, Shiuh-Bin Chen, Parkson W. Chen, Rik M. Jonckheere, Vicky Philipsen, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Thomas Schätz, Karl Sommer Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment
	Patente Hans-Jürgen Brück, Frank Hillmann , Gerd Scheuring, Hans-Artur Bösser, Wolfgang Vollrath US Patent #20070206279 Device for inspecting a microscopic component by means of an immersion objective DE Patent DE102004033195A1 Vorrichtung zur Inspektion eines mikroskopischen Bauteils JP Patent JP2005099024 Apparatus for measuring width of pattern structure on mask or substrate for semiconductor industry
	The Journal of Physical Chemistry B F. Hillmann , J. Voigt, H. Redlin, K.-D. Irrgang, G. Renger Optical dephasing in the light harvesting complex II : A two-pulse photon echo study
	Applied Physics Letters F. Hillmann , J. Voigt, H. Redlin Two-photon excited photon echo in CdS
	Biophysical Journal R. Schödel, F. Hillmann , T. Schrötter, K.-D. Irrgang, J. Voigt, G. Renger Kinetics of excited states of pigment clusters in solubilized light- harvesting complex II: photon density-dependent fluorescence yield and transmittance
	Dissertation F. Hillmann Untersuchungen zur Relaxation von Anregungszuständen im Lichtsammelkomplex des Photosystems II höherer Pflanzen sowie im Halbleiter Cadmiumsulfid mittels Vierwellenmischung eingereicht am 11.07.2001, verteidigt am 13.11.2001
	Diplomarbeit F. Hillmann Experimentelle und theoretische Untersuchungen zur nichtlinearen Absorption von Bestandteilen des Photosyntheseapparates verteidigt am 18.04.1995